![]() nMOS fabrication, n-well and p-well process. Unit process in VLSI and IC fabrication: Unit process in VLSI: Wafer preparation, Oxidation, Diffusion, Ion implantation, Deposition, Metallization, Etching and Lithography.Scaling: constant field and constant voltage scaling, Short-channel effects.MOSFET: Electrical characteristics of MOSFET, Threshold voltage, Body effect, current expression (gradual channel approximation method), Channel length modulation, MOSFET.Design style: Full custom, Gate array, standard-cell, Macro cell based design, Field programmable devices, design quality.VLSI Methodologies: Introduction to VLSI design, Moore’s Law, VLSI Design flow, Design hierarchy, VLSI.
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